A TiNiCu Thin Film Micropump Made by Magnetron Co-Sputtered Method
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چکیده
منابع مشابه
A Transmission Electron-Microscopy Study of RF-Magnetron-Sputtered and DC-Magnetron-Sputtered Thin-Film Chromium and Chromium Platinum Coatings
Microstructural features of sputtered chromium and chromium-50 wt. % platinum thin films on carbon substrates are presented. Films produced by rf sputtering and dc magnetron sputtering are compared using analytical electron microscopy techniques. All rf-sputtered films are uniform in chemistry and thickness and are amorphous. The chromium film became crystalline with a grain size ofless than 10...
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AlN thin films deposited at room temperature by reactive DC magnetron sputtering of Al target in pure argon and nitrogen atmosphere. Thin films were deposited on glass and silicon (Si) substrate at different DC power. The variation of DC power on the structural, electrical and optical properties of the films were investigated. Enhancement of crystallinity and conductivity was observed with incr...
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The growth characteristics of magnetron sputtered Co-22%Cr thin films on amorphous glass or carbon substrates have been investigated utilizing transmission electron microscopy, X-ray diffraction and electrical resistivity measurements. Results indicate that the initial deposit is “amorphous”. but that small crystallites form before the film reaches 5 nm film thickness. By 10 nm, well oriented g...
متن کاملMAGNETRON SPUTTERED Al-ZnO THIN FILMS FOR PHOTOVOLTAIC APPLICATIONS
The optimization process of the RF magnetron sputtered Al doped ZnO (AZO) thin films was carried out by studying its structural, optical, electrical, and morphological properties at different RF power and different working pressures for its use as a front-contact for the copper indium diselenide (CIS) based thin film solar cell. The structural study suggests that the preferred orientation of gr...
متن کاملFabrication and Characteristics of RF Magnetron Sputtered ITO Thin Films
Indium tin oxide (ITO) films have been deposited onto glass substrates by ifmagnetron sputtering without insitu substrate heating. The as-deposited films have an electrical resistivity of 5x1O a-cm, visible transmittance of about 85%, and infrared (IR) reflectance of above 80% at 5 jim. The effect of sputtering parameters on the deposition rate and the electrical and optical properties of ITO f...
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ژورنال
عنوان ژورنال: MATERIALS TRANSACTIONS
سال: 2006
ISSN: 1345-9678,1347-5320
DOI: 10.2320/matertrans.47.532